BD(Sublimed grade) CAS#: 1292285-21-2

By Janice Zhang, 20th May 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Patent Information

No data available

Physical Data

Appearance	Yellow-green powder
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Melting Point, °C

317

Sublimation, °C	Pressure (Sublimation), Torr
317	0.0165017

Spectra

Description (NMR Spectroscopy)	Nucleus (NMR Spectroscopy)	Solvents (NMR Spectroscopy)	Frequency (NMR Spectroscopy), MHz	Original Text (NMR Spectroscopy)	Comment (NMR Spectroscopy)
Chemical shifts	1H	chloroform-d1	400
Chemical shifts	13C	chloroform-d1
Chemical shifts	1H	chloroform-d1	300	¹H NMR data of the obtained compound is shown below. ¹H NMR (CDCl₃, 300 MHz): δ=2.21 (s, 6H), 6.67 (d, J=7.2 Hz, 2H), 6.74 (d, J=7.2 Hz, 2H), 7.17-7.23 (m, 34H), 7.62 (d, J=7.8 Hz, 4H), 7.74 (d, J=7.8 Hz, 2H), 7.86 (d, J=9.0 Hz, 2H), 8.04 (d, J=8.7 Hz, 4H).
	1H	chloroform-d1	300	1H NMR (CDC1₃, 300 MHz): δ = 2.21 (s, 6H), 6.67 (d, J = 7.2 Hz, 2H), 6.74 (d, J = 7.2 Hz, 2H), 7.17-7.23 (m, 34H), 7.62 (d, J = 7.8 Hz, 4H), 7.74 (d, J = 7.8 Hz, 2H), 7.86 (d, J = 9.0 Hz, 2H), 8.04 (d, J = 8.7 Hz, 4H)

Description (Mass Spectrometry)

high resolution mass spectrometry (HRMS), spectrum

ESI (Electrospray ionisation)

Route of Synthesis (ROS)

Conditions	Yield
With tri-tert-butyl phosphine; sodium t-butanolate; bis(dibenzylideneacetone)-palladium(0) In hexane; toluene at 60 – 80℃; for 3h; Inert atmosphere;	93%
With tri-tert-butyl phosphine; bis(dibenzylideneacetone)-palladium(0); sodium t-butanolate In hexane; toluene at 60 – 80℃; for 3h; Inert atmosphere;	93%
With tri-tert-butyl phosphine; sodium t-butanolate; bis(dibenzylideneacetone)-palladium(0) In hexane; toluene at 80℃; for 3h; Inert atmosphere;	67%

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	No data available
Storage	Under the room temperature and away from light
Shelf Life	2 years
Market Price	USD

Druglikeness
Lipinski rules component
Molecular Weight	1045.34
logP	24.13
HBA	2
HBD	0
Matching Lipinski Rules	2
Veber rules component
Polar Surface Area (PSA)	6.48
Rotatable Bond (RotB)	10
Matching Veber Rules	2

Use Pattern

It is mainly used as electron‑transport layer (ETL) material and hole‑blocking layer (HBL) material in high‑performance OLED panels for mobile phones, televisions and flexible displays.

With high electron mobility, excellent thermal stability and good hole‑blocking capability, it effectively reduces driving voltage, improves luminous efficiency and extends device service life.

It can also serve as a host material for blue‑light and green‑light OLED emitting layers, suitable for phosphorescent and TADF systems to suppress efficiency roll‑off.

Additionally, it is applied in research of organic photovoltaic (OPV) and perovskite solar cells, as well as laboratory development of new optoelectronic materials.

TsCDase CAS# EC:3.2.1.54

By Janice Zhang, 14th May 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Product Name	TsCDase
IUPAC Name	Cyclomaltodextrinase
Molecular Structure
EC	3.2.1.54
EINECS Number	No data available
MDL Number	No data available
Beilstein Registry Number	No data available
Synonyms	No data available
Molecular Formula	No data available
Molecular Weight	72kD
InChI	No data available
InChI Key	No data available
Canonical SMILES	No data available

Patent Information

No data available

Physical Data

Appearance	Colorless to light brown liquid
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

No data available

Route of Synthesis (ROS)

No data available

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Transport with ice packs or dry ice;
HS Code	No data available
Storage	Store at -20°C;
Shelf Life	18 months.
Market Price	USD

Druglikeness
No data available

Use Pattern

The TsCDase gene is derived from Thermococcus sp. Strain B1001 (EC: 3.2.1.54) and is recombinantly expressed in Escherichia coli.

It catalyzes the hydrolysis of cyclodextrins into maltose; specifically, α-cyclodextrin is hydrolyzed into maltooctaose, β-cyclodextrin into maltoheptaose, and γ-cyclodextrin into maltohexaose.

D-xylose dehydrogenase CAS#: 62931-20-8

By Janice Zhang, 14th May 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Product Name	D-xylose dehydrogenase CAS#: 62931-20-8
IUPAC Name	CvXylB
Molecular Structure
CAS Registry Number	62931-20-8
EINECS Number	No data available
MDL Number	No data available
Beilstein Registry Number	No data available
Synonyms	No data available
Molecular Formula	No data available
Molecular Weight	27kDa
InChI	No data available
InChI Key	No data available
Canonical SMILES	No data available

Patent Information

No data available

Physical Data

Appearance	Colorless clear to very slightly hazy liquid
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

No data available

Route of Synthesis (ROS)

No data available

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Transport with ice packs or dry ice;
HS Code	No data available
Storage	Store at -20°C;
Shelf Life	18 months.
Market Price	USD

Druglikeness
No data available

Use Pattern

CvXylB (Xylose Dehydrogenase), EC: 1.1.1.175, is derived from Caulobacter vibrioides and participates in the degradation of D-xylose—a primary constituent of hemicelluloses such as xylan.

It catalyzes the initial reaction of the xylose utilization pathway by oxidizing D-xylose into D-xylono-1,4-lactone.

It exhibits some activity toward L-arabinose but demonstrates negligible activity toward D-arabinose, L-xylose, D-ribose, D-galactose, D-glucose, or D-glucose-6-phosphate.

Sulfonium, triphenyl-, salt with 3,3,4,4-tetrafluoro-4-sulfobutyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS#: 1001347-91-6

By Janice Zhang, 21st April 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Patent Information
Patent ID	Title	Publication Date
CN119264025	Preparation method of photoacid generator for semiconductor photoresist	2025
TW2024/23898	Radiation-sensitive resin composition, pattern formation method, and radiation-sensitive acid-generating agent	2024

Physical Data

Appearance	White to off-white powder
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

Description (NMR Spectroscopy)	Nucleus (NMR Spectroscopy)
Chemical shifts, Spectrum	1H

Route of Synthesis (ROS)

Conditions

Yield

With trifluoroacetic acid; trifluoroacetic anhydride at -20 – 40℃; for 12h; Temperature; Inert atmosphere;

Experimental Procedure
1.2-1.3; 6.2-6.3; 7.2-7.3; 8.2-8.3; 9.2-9.3; 10.2-10.3; 11.2-11.2; 12.2-12.3; 13.2-13.3; 14.2-14.3; 15.2-15.3; 16.2-16.3; 17.2-17.3; 2.2-2.3; 3.2-3.3; 4.2-4.3; 5.2-5.3
S2. The reactor was purged with nitrogen, 148.0 g of the intermediate product 1,1,2,2-tetrafluoro-4-hydroxybutane-1-sulfonic acid triphenylsulfonium salt, 60.0 g of adamantane carboxylic acid and 624.1 g of trifluoroacetic acid were added and stirred to dissolve, the reaction temperature was lowered to -20 °C, 127.2 g of trifluoroacetic anhydride was added dropwise, and after the addition was completed, the temperature was raised to 40 °C and the reaction was carried out for 12 h. After the reaction was completed, the reaction was distilled under reduced pressure to obtain a concentrated reaction solution; S3. In the concentrated reaction solution prepared in S2, 2 kg of methyl tert-ether was added as a precipitating solvent, and recrystallized, stirred for 4 h, and then filtered to obtain 177.8 g of a photoacid generator;

90.2%

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	No data available
Storage	Under the room temperature and away from light
Shelf Life	1 year
Market Price	USD

Druglikeness
Lipinski rules component
Molecular Weight	650.756
logP	9.792
HBA	5
HBD	2
Matching Lipinski Rules	2
Veber rules component
Polar Surface Area (PSA)	51.21
Rotatable Bond (RotB)	10
Matching Veber Rules	2

Use Pattern

Serves as a photoacid generator (PAG) in chemically amplified photoresists, mainly used for semiconductor lithography processes such as KrF (248 nm) and ArF (193 nm) exposure, to realize high-resolution pattern formation for integrated circuits and advanced chip manufacturing.

Applied in electronics imaging materials including LCD panels, printing plates, photocurable coatings and inks, providing high sensitivity and thermal stability.

Used as a photochemical reagent in organic synthesis and laboratory R&D, for light-triggered acid-catalyzed reactions in fine chemical preparation.

Peptide HHC-36 CAS#:

By Janice Zhang, 21st April 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Product Name	Peptide HHC-36
Sequence	KRWWKWWRR
Molecular Structure	No data available
CAS Registry Number	No data available
EINECS Number	No data available
MDL Number	No data available
Beilstein Registry Number	No data available
Synonyms
Molecular Formula	No data available
Molecular Weight	No data available
InChI	No data available
InChI Key	No data available
Canonical SMILES	No data available

Patent Information

No data available

Physical Data

Appearance	White powder
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

Route of Synthesis (ROS)

No data available

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	293719
Storage	Under the room temperature and away from light
Shelf Life	1 year
Market Price	USD

Use Pattern

HHC-36 is a broad-spectrum antimicrobial peptide frequently utilized in anti-infection research and in the development of antibiotic alternatives. It is well-suited for antimicrobial surface modification, with applications ranging from coatings for medical devices (such as catheters and implants) and wound dressings (specifically anti-infection dressings) to the antimicrobial treatment of surgical materials.

9,9-Bis(3,4-dicarboxyphenyl)fluorene dianhydride CAS#: 135876-30-1

By Janice Zhang, 24th March 2026

Triphenylsulfonium, 2-hydroxybenzoate (1:1) CAS#: 345580-99-6

By Janice Zhang, 3rd February 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Patent Information
Patent ID	Title	Publication Date
TW2025/28287	Resin composition, film, pattern formation method, and electronic device manufacturing method	2025
KR2024/76711	CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN	2024

Physical Data

Appearance	White to off-white powder
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

No data available

Route of Synthesis (ROS)

Conditions

Yield

With sodium hydrogencarbonate In water at 20℃; for 1.16667h;
Experimental Procedure
Synthesis of Sulfonium Salt D-1
Pure water was added to 10.0 g (72.4 mmol) of salicylic acid and 6.1 g (72.4 mmol) of sodium bicarbonate, and the mixture was stirred for 10 minutes. Then, 21.6 g (72.4 mmol) of triphenylsulfonium chloride was added. After stirring at room temperature for 1 hour, the layers were separated, and the resulting organic layer was washed with pure water. The solvent was then removed using a rotary evaporator to obtain a crude product. The resulting crude product was purified by silica gel chromatography to obtain 27.2 g (94% yield) of the desired product (sulfonium salt D-1).

94%

Safety and Hazards

Pictogram(s)
Signal	Danger
GHS Hazard Statements	H301 (88.9%): Toxic if swallowed [Danger Acute toxicity, oral] H315 (11.1%): Causes skin irritation [Warning Skin corrosion/irritation] H319 (11.1%): Causes serious eye irritation [Warning Serious eye damage/eye irritation] Information may vary between notifications depending on impurities, additives, and other factors.
Precautionary Statement Codes	P264, P264+P265, P270, P280, P301+P316, P302+P352, P305+P351+P338, P321, P330, P332+P317, P337+P317, P362+P364, P405, and P501 (The corresponding statement to each P-code can be found at the GHS Classification page.)

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	No data available
Storage	Under the room temperature and away from light
Shelf Life	2 years
Market Price	USD

Druglikeness
Lipinski rules component
Molecular Weight	400.498
logP	6.693
HBA	2
HBD	1
Matching Lipinski Rules	3
Veber rules component
Polar Surface Area (PSA)	60.36
Rotatable Bond (RotB)	4
Matching Veber Rules	2

Use Pattern

I. Core Function: Photoacid Generator (PAG)
This compound is a triphenylsulfonium salt-based photoacid generator (PAG). Under UV or deep-UV (DUV) irradiation:
It absorbs light and undergoes photolytic cleavage
Generates a strong acid
The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.
II. Main Application Areas
1. Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)
Applicable to:
i-line, KrF, and ArF lithography systems
High-resolution chemically amplified photoresists
Main functions:
Acid generation upon exposure
Catalyzes deprotection reactions
Amplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) control
Advantages of the ortho-hydroxybenzoate structure:
Provides good photosensitivity
Reduces acid diffusion, improving resolution
Works synergistically with the triphenylsulfonium cation → good thermal stability and stable photoresist performance
2. Cationic Photocuring Systems
Used in UV-induced cationic curing of epoxy resins and vinyl ether systems
UV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinking
Applications include:
UV-curable coatings and inks
Electronic encapsulation materials
Photo-patternable insulating layers (e.g., PSPI, PI)

Triphenylsulfonium salt with 1-(tricyclo[3.3.1.13,7]dec-1-ylmethyl) 2,2-difluoro-2-sulfoacetate (1:1) CAS#: 1022939-88-3

By Janice Zhang, 2nd February 2026

Triphenylsulfonium salt with 1-(tricyc

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Patent Information
Patent ID	Title	Publication Date
US2016/168115	SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN	2016
JP2018/145179	SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN	2018

Physical Data

Appearance	White to off-white powder
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

Nucleus (NMR Spectroscopy)	Solvents (NMR Spectroscopy)	Original Text (NMR Spectroscopy)
1H	chloroform-d1	¹H NMR (measurement solvent: deuterium chloroform, reference material: tetramethylsilane); δ=7.72 (m, 15H; TPS), 3.85 (s, 2H; CH₂), 1.92 (m, 3H; 1-Ad), 1.62 (m, 12H; 1-Ad).
1H	chloroform-d1	¹⁹F NMR (measurement solvent: deuterium chloroform, reference material: trichlorofluoromethane); δ=-110.0 (s, 2F; CF₂).

Description (Mass Spectrometry)	Comment (Mass Spectrometry)	Peak
ESI (Electrospray ionisation), LCMS (Liquid chromatography mass spectrometry)	Molecular peak
ESI (Electrospray ionisation)	Molecular peak	263.2 m/z
LCMS (Liquid chromatography mass spectrometry), ESI (Electrospray ionisation)
LCMS (Liquid chromatography mass spectrometry), ESI (Electrospray ionisation)

Description (UV/VIS Spectroscopy)

Spectrum

Route of Synthesis (ROS)

Conditions	Yield
In water at 80℃;	100%
In methanol; water for 15h;

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	No data available
Storage	Under the room temperature and away from light
Shelf Life	2 years
Market Price	USD

Druglikeness
Lipinski rules component
Molecular Weight	586.721
logP	8.553
HBA	5
HBD	0
Matching Lipinski Rules	2
Veber rules component
Polar Surface Area (PSA)	91.88
Rotatable Bond (RotB)	8
Matching Veber Rules	2

Use Pattern

Core Function: Photoacid Generator (PAG)

It absorbs light and undergoes photolytic cleavage

Produces a strong acid (difluoromethanesulfonic acid)
The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.
II. Main Application Areas
1.Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)
Applicable to:
i-line, KrF, and ArF lithography systems
High-resolution chemically amplified photoresists
Main functions:
Acid generation upon exposure
Catalyzes deprotection reactions
Amplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) control
Advantages of the adamantyl structure:
Provides high thermal stability
Reduces acid diffusion → improves resolution and line edge roughness
Enhances optical performance and formulation stability of photoresists
Cationic Photocuring Systems
Used in UV-induced cationic curing of epoxy resins and vinyl ether materials
UV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinking
Applications include:
UV-curable coatings and inks
Electronic encapsulation materials
Photo-patternable insulating layers (e.g., PSPI, PI)

Sulfonium, [4-[1-(difluorosulfomethyl)-2,2,2-trifluoroethoxy]phenyl]bis[4-(1,1-dimethylethyl)phenyl]-, inner salt CAS#: 1465790-38-8

By Janice Zhang, 2nd February 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Patent Information

No data available

Physical Data

Appearance	White to off-white powder
Solubility	No data available
Flash Point	No data available
Refractive index	No data available
Sensitivity	No data available

Spectra

No data available

Route of Synthesis (ROS)

No data available

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	No data available
Storage	Under the room temperature and away from light
Shelf Life	2 years
Market Price	USD

Druglikeness
Lipinski rules component
Molecular Weight	602.687
logP	10.365
HBA	3
HBD	0
Matching Lipinski Rules	2
Veber rules component
Polar Surface Area (PSA)	34.14
Rotatable Bond (RotB)	10
Matching Veber Rules	2

Use Pattern

Core Function: Photoacid Generator (PAG)

It absorbs light and undergoes photolytic cleavage

Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS#: 1228823-28-6

By Janice Zhang, 2nd February 2026

Identification	Physical Data	Spectra
Route of Synthesis (ROS)	Safety and Hazards	Other Data

Identification

Patent Information

No data available

Physical Data

No data available

Spectra

No data available

Route of Synthesis (ROS)

Conditions	Yield
In dichloromethane; water at 20℃;

Safety and Hazards

GHS Hazard Statements

Not Classified

Other Data

Transportation	NONH for all modes of transport
	Under the room temperature and away from light
HS Code	No data available
Storage	Under the room temperature and away from light
Shelf Life	2 years
Market Price	USD

Druglikeness
Lipinski rules component
Molecular Weight	550.74
logP	8.03
HBA	5
HBD	0
Matching Lipinski Rules	2
Veber rules component
Polar Surface Area (PSA)	91.88
Rotatable Bond (RotB)	8
Matching Veber Rules	2

Use Pattern

Core Function: Photoacid Generator (PAG)

It absorbs light and undergoes photolytic cleavage

Product Name	BD(Sublimed grade)
IUPAC Name	N,N’-bis(3-methylphenyl)-N,N’-bis[3-(9-phenyl-9H-fluoren-9-yl)phenyl]pyrene-1,6-diamine
Molecular Structure
CAS Registry Number	1292285-21-2
EINECS Number	No data available
MDL Number	No data available
Beilstein Registry Number	No data available
Synonyms	1,6mMemFLPAPrn
Molecular Formula	C80H56N2
Molecular Weight	1045.31
InChI	No data available
InChI Key	No data available
Canonical SMILES	No data available

英文名	Triphenylsulfonium, 2-hydroxybenzoate (1:1)
IUPAC Name	2-carboxyphenolate;triphenylsulfanium
Molecular Structure
CAS Registry Number	345580-99-6
EINECS Number	No data available
MDL Number	No data available
Beilstein Registry Number	No data available
Synonyms	triphenylsulfonium 2-hydroxybenzoatetriphenylsulfonium salicylate
Molecular Formula	C25H20O3S
Molecular Weight	400.5
InChI	InChI=1S/C18H15S.C7H6O3/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;8-6-4-2-1-3-5(6)7(9)10/h1-15H;1-4,8H,(H,9,10)/q+1;/p-1
InChI Key	KKLIEUWPBXKNFS-UHFFFAOYSA-M
Canonical SMILES	C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3.C1=CC=C(C(=C1)C(=O)O)[O-]

英文名	Triphenylsulfonium (3-hydroxytricyclo[3.3.1.13,7]decane-1-methoxycarbonyl)difluoromethane sulfonate
IUPAC Name
Molecular Structure
CAS Registry Number	912290-04-1
EINECS Number	No data available
MDL Number	No data available
Beilstein Registry Number	No data available
Synonyms	bis(4-tert-butylphenyl)-{4-(1,1,3,3,3-pentafluoro-1-sulfonatopropan-2-yloxy)phenyl}-sulfonium
Molecular Formula	C29H31F5O4S2
Molecular Weight	602.68
InChI
InChI Key	WNLKPXMQEKEKRJ-UHFFFAOYSA-N
Canonical SMILES