Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1) CAS#: 1228823-28-6; 凯望编码 (ChemWhat Code): 1491738

IdentificationPhysical DataSpectra
Route of Synthesis (ROS)Safety and HazardsOther Data

Identification

英文名Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1:1)
IUPAC Name2-(adamantane-1-carbonyloxy)ethanesulfonate;triphenylsulfanium
分子结构Structure of Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (11) CAS 1228823-28-6
CAS编号 1228823-28-6
EINECS NumberNo data available
MDL NumberNo data available
Beilstein Registry NumberNo data available
别名triphenylsulfonium 2-(adamantane-1-carbonyloxy)ethanesulfonate
分子式C31H34O5S2
分子量550.7
InChIInChI=1S/C18H15S.C13H20O5S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;14-12(18-1-2-19(15,16)17)13-6-9-3-10(7-13)5-11(4-9)8-13/h1-15H;9-11H,1-8H2,(H,15,16,17)/q+1;/p-1
InChI KeyWYYSEXOKTYXQKL-UHFFFAOYSA-M
Canonical SMILESC1C2CC3CC1CC(C2)(C3)C(=O)OCCS(=O)(=O)[O-].C1=CC=C(C=C1)[S+](C2=CC=CC=C2)C3=CC=CC=C3
Patent Information
No data available

Physical Data

No data available

Spectra

No data available

Route of Synthesis (ROS)

Route of Synthesis (ROS) of Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1 1) CAS# 1228823-28-6
Route of Synthesis (ROS) of Sulfonium, triphenyl-, salt with 2-sulfoethyl tricyclo[3.3.1.13,7]decane-1-carboxylate (1 1) CAS#: 1228823-28-6
ConditionsYield
In dichloromethane; water at 20℃;

Safety and Hazards

GHS Hazard StatementsNot Classified

Other Data

TransportationNONH for all modes of transport
Under the room temperature and away from light
HS CodeNo data available
StorageUnder the room temperature and away from light
Shelf Life2 years
Market PriceUSD
Druglikeness
Lipinski rules component
分子量550.74
logP8.03
HBA5
HBD0
Matching Lipinski Rules2
Veber rules component
Polar Surface Area (PSA)91.88
Rotatable Bond (RotB)8
Matching Veber Rules2
Use Pattern
Core Function: Photoacid Generator (PAG)
It absorbs light and undergoes photolytic cleavage
Produces a strong acid (difluoromethanesulfonic acid)
The generated acid can catalyze chemically amplified reactions or initiate subsequent cationic polymerization. It is a key functional additive in photoresist and cationic photopolymer curing systems.
II. Main Application Areas
1.Semiconductor Photoresists (Chemically Amplified Photoresists, CARs)
Applicable to:
i-line, KrF, and ArF lithography systems
High-resolution chemically amplified photoresists
Main functions:
Acid generation upon exposure
Catalyzes deprotection reactions
Amplifies exposure effects → improves resolution, sensitivity, and critical dimension / line edge roughness (CD/LER) control
Advantages of the adamantyl structure:
Provides high thermal stability
Reduces acid diffusion → improves resolution and line edge roughness
Enhances optical performance and formulation stability of photoresists
Cationic Photocuring Systems
Used in UV-induced cationic curing of epoxy resins and vinyl ether materials
UV irradiation → acid generation → initiates cationic ring-opening polymerization or crosslinking
Applications include:
UV-curable coatings and inks
Electronic encapsulation materials
Photo-patternable insulating layers (e.g., PSPI, PI)

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