TBPDPS-PFBS CAS#: 258872-05-8; 凯望编码 (ChemWhat Code): 1499782

IdentificationPhysical DataSpectra
Route of Synthesis (ROS)Safety and HazardsOther Data

Identification

英文名TBPDPS-PFBS
IUPAC名称(4-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
分子结构Structure of TBPDPS-PFBS CAS 258872-05-8
CAS Registry Number 258872-05-8
EINECS NumberNo data available
MDL NumberNo data available
Beilstein Registry NumberNo data available
SynonymsDi-p-tolyl iodonium salt: perfluorobutyl sulphonate (1:1)
Diphenyl 4-tertbutylphenylsulfonium nonafluorobutanesulfonate
(4-tert-butylphenyl)-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
(4-(tert-Butyl)phenyl)diphenylsulfonium 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
Diphenyl 4-tert-butylphenylsulfonium nonafluorobutanesulfonate
Sulfonium, [4-(1,1-Dimethylethyl)Phenyl]Diphenyl-,1,1,2,2,3,3,4,4,4-Nonafluoro-1-Butanesulfonate (1:1)
Molecular FormulaC26H23F9O3S2
Molecular Weight618.6
InChIInChI=1S/C22H23S.C4HF9O3S/c1-22(2,3)18-14-16-21(17-15-18)23(19-10-6-4-7-11-19)20-12-8-5-9-13-20;5-1(6,3(9,10)11)2(7,8)4(12,13)17(14,15)16/h4-17H,1-3H3;(H,14,15,16)/q+1;/p-1
InChI KeyGXZZZWUTJCPYHC-UHFFFAOYSA-M
Canonical SMILESCC(C)(C)C1=CC=C(C=C1)S+C3=CC=CC=C3.C(C(C(F)(F)S(=O)(=O)[O-])(F)F)(C(F)(F)F)(F)F
Patent Information
No data available

Physical Data

AppearanceWhite to off-white powder
SolubilityNo data available
Flash PointNo data available
Refractive indexNo data available
SensitivityNo data available

Spectra

No data available

Route of Synthesis (ROS)

No data available

Safety and Hazards

GHS Hazard StatementsNot Classified

Other Data

TransportationNONH for all modes of transport
Under the room temperature and away from light
HS CodeNo data available
StorageUnder the room temperature and away from light
Shelf Life2 years
Market PriceUSD
Druglikeness
No data available
Use Pattern
used as a photoacid generator (PAG) in chemically amplified photoresist systems for advanced semiconductor lithography.
Upon exposure to UV or deep ultraviolet (DUV) light, it generates strong acids that initiate catalytic deprotection reactions in photoresist materials, enabling high-resolution pattern formation.

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