TETRAKIS(DIETHYLAMINO)HAFNIUM CAS#: 19824-55-6; 凯望编码 (ChemWhat Code): 33546

IdentificationPhysical DataSpectra
Route of Synthesis (ROS)Safety and HazardsOther Data

Identification

英文名TETRAKIS(DIETHYLAMINO)HAFNIUM
IUPAC Namediethylazanide;hafnium(4+)  
分子结构TETRAKISDIETHYLAMINOHAFNIUM-CAS-19824-55-6
CAS编号 19824-55-6
MDL NumberMFCD00799095
别名Hafnium, tetrakis(diethylamino)-
19824-55-6
Tetrakis(diethylamino)hafnium
diethylazanide;hafnium(4+)
Tetrakis(diethylamido)hafnium(IV)
19962-12-0
Ethanamine, N-ethyl-, hafnium(4+) salt (4:1)
tetrakis-diethylaminohafnium
SCHEMBL57242
Tetrakis(diethylamino)hafnium(IV)
MFCD00799095
Tetrakis(diethylamino)hafnium 99.999%
Tetrakis(diethylamido)hafnium(IV), 99.99%
分子式C16H40HfN4
分子量467
InChIInChI=1S/C5H6N2/c6-5-2-1-3-7-4-5/h1-4H,6H2InChI=1S/4C4H10N.Hf/c4*1-3-5-4-2;/h4*3-4H2,1-2H3;/q4*-1;+4  =1S/C5H6N2/c6-5-2-1-3-7-4-5/h1-4H,6H2
InChI KeyVBCSQFQVDXIOJL-UHFFFAOYSA-N 
Isomeric SMILESCC[N-]CC.CC[N-]CC.CC[N-]CC.CC[N-]CC.[Hf+4] 

Physical Data

AppearanceYellow liquid

Spectra

No data available


Route of Synthesis (ROS)

Route of Synthesis (ROS) of TETRAKIS(DIETHYLAMINO)HAFNIUM CAS 19824-55-6
Route of Synthesis (ROS) of TETRAKIS(DIETHYLAMINO)HAFNIUM CAS 19824-55-6
ConditionsYield
In toluene at -79 – 20℃; for 4h; Inert atmosphere; Schlenk technique; Glovebox;76%

Safety and Hazards

Pictogram(s)
SignalDanger
GHS Hazard StatementsH225 (100%): Highly Flammable liquid and vapor [Danger Flammable liquids]
H260 (33.85%): In contact with water releases flammable gases which may ignite spontaneously [Danger Substances and mixtures which in contact with water, emit flammable gases]
H261 (92.31%): In contact with water releases flammable gas [Danger Substances and mixtures which in contact with water, emit flammable gases]
H300 (33.85%): Fatal if swallowed [Danger Acute toxicity, oral]
H310 (33.85%): Fatal in contact with skin [Danger Acute toxicity, dermal]
H314 (40%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation]
H315 (60%): Causes skin irritation [Warning Skin corrosion/irritation]
H319 (60%): Causes serious eye irritation [Warning Serious eye damage/eye irritation]
H330 (33.85%): Fatal if inhaled [Danger Acute toxicity, inhalation]
H335 (100%): May cause respiratory irritation [Warning Specific target organ toxicity, single exposure; Respiratory tract irritation]
Precautionary Statement CodesP210, P223, P231+P232, P233, P240, P241, P242, P243, P260, P261, P262, P264, P264+P265, P270, P271, P280, P284, P301+P316, P301+P330+P331, P302+P335+P334, P302+P352, P302+P361+P354, P303+P361+P353, P304+P340, P305+P351+P338, P305+P354+P338, P316, P319, P320, P321, P330, P332+P317, P337+P317, P361+P364, P362+P364, P363, P370+P378, P402+P404, P403+P233, P403+P235, P405, and P501
(The corresponding statement to each P-code can be found at the GHS Classification page.)

Other Data

No data available

Druglikeness
Lipinski rules component
分子量471.042
HBA4
HBD0
Matching Lipinski Rules3
Veber rules component
Polar Surface Area (PSA)12.96
Rotatable Bond (RotB)12
Matching Veber Rules1
Use Pattern
TETRAKIS(DIETHYLAMINO)HAFNIUM CAS 19824-55-6 are frequently used in thin film deposition, particularly in the semiconductor manufacturing industry. They serve as precursor materials for thin film preparation, for example, in the fabrication processes of integrated circuits and other electronic devices.

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